|
Undertaking EBSD experiments
Spatial resolution
The electrons contributing to the diffraction pattern
originate within nanometres of the sample surface. Hence the spatial
resolution will be related to the electron beam diameter and this depends on
the type of electron source and probe current used. Typical beam diameters
at 0.1 nA probe current and 20 kV accelerating voltage are 2 nm for a FEG
source and 30nm for a tungsten source. The beam profile on the sample
surface will also be elongated in the direction perpendicular to the tilt.
The spatial resolution achieved in practice will depend on the sample, SEM
operating conditions and electron source used and under optimum conditions
grains as small as 10 nm can be identified.
Measurement accuracy
Orientation measurement
Errors in crystal orientation measurements from the
diffraction pattern will depend principally on the accuracy of the Kikuchi
band position measurement and the system calibration and are generally in
the range of ±0.5°. To avoid systematic errors in orientation measurements
with respect to the sample axes for texture measurements, care should be
taken to ensure that the sample normal and longitudinal directions are
oriented correctly with respect to the phosphor screen.
Residual errors
For each orientation measurement a residual angle can be calculated where
|
 |
(Equation 6) |
is
the measured angle between the ith
pair of Kikuchi bands, is
the actual angle between the corresponding crystal planes and n is the
number of Kikuchi band pairs. is
a measure of the degree of fit of a solution to the diffraction pattern and
is used to rank possible solutions. Residual error values higher than
1.5° can suggest the system calibration needs to be checked
.
Back | Next |